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conferenceseries.com
October 20-22, 2016 Rome, Italy
11th International Conference and Expo on
Nanoscience and Molecular Nanotechnology
Volume 7, Issue 5 (Suppl) J Nanomed Nanotechnol 2016
ISSN: 2157-7439 JNMNT an open access journal NanoScience 2016
October 20-22, 2016
A new stitching soft X-ray interference lithography technique
Yanqing Wu
Shanghai Institute of Applied Physics - CAS, P R China
Anew stitching soft X-ray interference lithography technique is developed in BL08U1B, SSRF. A special multi-beam grating mask
for soft X-ray is employed in this technique, which adopted permalloy as the beam stop layer to improve the service life. An
order-sorting aperture (OSA) is necessary to block the 0th order diffraction beams from the mask to realize stitching the exposure
area one by one via moving the wafer with a micron precision. And a new in situ monitoring scheme using high harmonics is
employed to collimate the mask and OSA. Therefore, the 0th order diffraction beams can be blocked completely and the undesired
pattern around the exposed area could be eliminated. In this way, the exposed depth has been increased from less than 100 nm up
to 300 nm and the exposed area is no longer decided by the mask and then could be stitched with a micron precision, up to several
square centimeters.
Biography
Yanqing Wu has completed his PhD from Fudan University and Post-doctoral studies from Pohang University of Science and Technology. He is the Team Leader
of Soft X-ray Team, Shanghai Synchron Radiation Facility. He has published more than 20 papers in reputed journals.
Yanqing Wu, J Nanomed Nanotechnol 2016, 7:5 (Suppl)