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Volume 3, Issue 2 (Suppl) Ind Chem
ISSN: 2469-9764, ICO an open access journa Industrial Chemistry 2017
May 22-23, 2017
May 22-23, 2017 Las Vegas, USA
2nd World Conference on
Industrial Chemistry and Water Treatment
Process improvement for arsenic removal from dirty acid wastewater
Dongyun Du
South-Central University for Nationalities, China
The aim of this study is to reduce the gross weight of As-containing hazardous waste in the process of treating dirty acid
wastewater. Research focused on arsenic removal from gypsum by washing. With washing solution pH being 3.0 and solid
liquid ration being 1:5, arsenic leaching concentration of gypsum after the washing process reduced from 40 mg/L to 2.1 mg/L.
In pickling condition, As(III) was oxidized to As(V) and the size of gypsum crystal was reduced. The above are reasons for
decreased arsenic leaching concentration. In addition, comparing to one-stage treatment process by using Ca(OH)2, the three-
stage counter current treatment process showed several advantages. First of all, arsenic concentration of filtrate was reduced
from 5 mg/L to 0.2 mg/L, which is below discharge limit (0.3 mg/L) (GB26132-2010). Secondly, it also avoided the production
of ferrous arsenate slag. With the use of this novel process, gypsum could become nontoxic and arsenic concentration could
be effectively reduced to 0.2 mg/L by adding Ca(OH)2. Therefore, such process has great potential in various industrial
applications.
Biography
Dongyun Du has abundant theoretical knowledge and practical experience in arsenic wastewater treatment. He has developed three novel methods for the
disposal of dirty acid wastewater and two kinds of absorbent material for removal of arsenic from groundwater. He has developed these technologies after years
of experience in research, teaching and administration in university. Recently, he studied on the recovery of valuable metals from waste residues in metallurgical
industry and the stabilization/solidification technology about high arsenic content of solid waste.
Dongyun Du, Ind Chem 2017, 3:2 (Suppl)