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Volume 08 Innovative Energy & Research
ISSN: 2576-1463 Advanced Energy Materials 2019
July 11-12, 2019
Notes:
conferenceseries.com
July 11-12, 2019 | Zurich, Switzerland
21st International Conference on
Advanced Energy Materials and Research
Page 21
4. Kosuke Takenaka, Keitaro Nakata, Giichiro Uchida, Yuichi Setsuhara and Akinori Ebe (2016) Effects of working
pressure on the physical properties of a-InGaZnOx films formed using inductively-coupled plasma-enhanced
reactive sputtering deposition. IEEE Transactions on Plasma Science 44:3099.
5. K Takenaka, K Nakata, HOtani, S Osaki, G Uchida and Y Setsuhara (2016) Process controllability of inductively
coupled plasma-enhanced reactive sputter deposition for the fabrication of amorphous in GaZnOx channel
thin-film transistors. Japanese Journal of Applied Physics 55:01AA18
Biography
Yuichi Setsuhara received his Dr Eng. in Electrical Engineering from Osaka University in 1991. He joined Welding Research Institute, Osaka University as
Research Associate in 1991, Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University as Associate Professor in 2001,
and has been a Professor in Joining and Welding Research Institute, Osaka University since 2004. He is currently a Vice Director of Joining and Welding
Research Institute (JWRI), Osaka University since 2014. He has published more than 150 papers in SCI journals and has been serving as Board Members of
several committees such as International Scientific Committee for International Conference on Plasma Surface Engineering and International Advisory Board
for the journal “Plasma Processes and Polymers”.