![Show Menu](styles/mobile-menu.png)
![Page Background](./../common/page-substrates/page0029.png)
Page 64
Notes:
conferenceseries
.com
Volume 4, Issue 4 (Suppl)
J Laser Opt Photonics, an open access journal
ISSN: 2469-410X
Optics 2017
November 15-17, 2017
November 15-17, 2017 | Las Vegas, USA
8
th
International Conference and Exhibition on
Lasers, Optics & Photonics
In situ
and
ex situ
optical characterization of nitride semiconductor crystal for advanced optical and power
electronic devices
S Nitta, Z Liu, S Usami, Z Ye, K Nagamatsu, M Kushimoto, M Deki, A Tanaka, Y Honda, M Pristovsek
and
H Amano
Nagoya University, Japan
M
ore compact, lighter and long lifetime mobile devices and more environmental friendly power supplies are being developed
by utilizing nitride semiconductors such as AlN, GaN, InN and their alloys. Together with high-efficiency InGaN blue light
emitting diodes (LEDs), high-spec and long-lifetime portable devices and general lighting will play an important role in a sustainable
modern 21
st
century society. AlGaN/GaN high electronmobility transistors have been used in new-generationmobile communication
bases, delivering more data with lower consumption. Finally, ultraviolet LEDs are widely used for curing and germicidal disinfection.
The potential of nitride semiconductors is not limited to these applications, but to achieve their potential, optics can help a lot.
High-quality, high-indium-content InGaN is a prerequisite for long-wavelength visible emission from green to red. However, InGaN
is difficult to grow with higher indium content because of the lattice parameters and growth conditions mismatch between GaN
and InN. Indium fluctuation and strain relaxation introduced by morphological degradation are substantial challenges. In order to
monitor crystal properties and surface evolution during growth, we used a three-wavelength laser beam scattering
in situ
monitoring
system on a horizontal metalorganic vapor phase epitaxy reactor. For electronic devices,
ex situ
emission microscopy is a powerful
tool for the analysis of critical defects on vertical GaN power electronic devices. The optical emission image of a biased device reflects
leakage information and allows us to identify the properties of defects.
Biography
S Nitta obtained his PhD in 2003 from Meijo University, Japan. Since then, he has been developing MOVPE equipment and high-efficiency blue and white LEDs at compa-
nies. In 2015, he joined Nagoya University as a designated Associate Professor. His research is focused on the epitaxial and bulk crystal growth of nitride semiconductors
and their applications to future optical and electronic devices.
nitta@nagoya-u.jpS Nitta et al., J Laser Opt Photonics 2017, 4:4 (Suppl)
DOI: 10.4172/2469-410X-C1-017